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Plasma Enhanced Chemical Vapor Deposition and Electrical Characterization of Diamond-Like Carbon Thin Films

机译：类金刚石碳薄膜的等离子体增强化学气相沉积和电学表征

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高知工科大学博士(工学) 平成19年9月28日授与 (甲第118号)

机译：高知工业大学博士（工学）2007年9月28日授予（第118号）

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Md. Kamrul Hassan;
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年度 2007
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专利

1. Characterization of diamond-like carbon thin films prepared by a microwave plasma enhanced chemical vapor deposition method [J] . Choi WS, Chung I, Lee YZ, Surface & Coatings Technology . 2004,第0期

机译：微波等离子体增强化学气相沉积法制备类金刚石碳薄膜的表征
2. Structural and electrical properties and current-voltage characteristics of nitrogen-doped diamond-like carbon films on Si substrates by plasma-enhanced chemical vapor deposition [J] . Tsuchiya Masato, Murakami Kazuki, Magara Kohei, Japanese journal of applied physics . 2016,第6期

机译：等离子体增强化学气相沉积在Si衬底上掺氮类金刚石碳膜的结构和电学性质以及电流电压特性
3. Thin-film Deposition Of Silicon-incorporated Diamond-like Carbon By Plasma-enhanced Chemical Vapor Deposition Using Monomethylsilane As A Silicon Source [J] . Hideki Nakazawa, Yuhki Asai, Takeshi Kinoshita, Japanese journal of applied physics . 2008,第11期

机译：以单甲基硅烷为硅源的等离子体化学气相沉积薄膜沉积硅结合的类金刚石碳
4. Characterization of Diamond-Like Carbon Films Prepared by Plasma Enhanced Chemical Vapor Deposition with Vertical-capacitor Electrodes [C] . Kwang Bae Lee, Byung Roh Rhee . 2001

机译：垂直电容器电极通过等离子增强化学气相沉积制备的类金刚石碳膜的表征
5. Plasma enhanced chemical vapor deposition of silicon thin films: Characterization of film growth at different frequencies and gas compositions utilizing plasma diagnostics. [D] . Zhu, Lala. 2014

机译：等离子体增强了硅薄膜的化学气相沉积：利用等离子体诊断技术表征不同频率和气体成分下的薄膜生长。
6. Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature [O] . Noor Hamizah Khanis, Richard Ritikos, Shafarina Azlinda Ahmad Kamal, 2017

机译：N2：（N2 + CH4）比在低温等离子体增强化学气相沉积法生长疏水纳米结构氢化氮化碳薄膜中的作用研究
7. Characterization of Boron Carbonitride (BCN) Thin Films Deposited by Radiofrequency and Microwave Plasma Enhanced Chemical Vapor Deposition [O] . M. A. Mannan, M. Nagano, K. Shigezumi, 2008

机译：射频和微波等离子体增强化学气相沉积法沉积碳氮化硼（BCN）薄膜的表征

Plasma Enhanced Chemical Vapor Deposition and Electrical Characterization of Diamond-Like Carbon Thin Films

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