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Tuning of Electrical and Optical Properties of Highly Conducting and Transparent Ta-Doped TiO2 Polycrystalline Films

机译:高导电透明Ta掺杂TiO2多晶膜的电学和光学特性的调谐

摘要

We present a detailed study on polycrystalline transparent conducting Ta-doped TiO2 films, obtained by room temperature pulsed laser deposition followed by an annealing treatment at 550°C in vacuum. The effect of Ta as a dopant element and of different synthesis conditions are explored in order to assess the relationship between material structure and functional properties, i.e. electrical conductivity and optical transparency. We show that for the doped samples it is possible to achieve low resistivity (of the order of 5×10-4 Ωcm) coupled with transmittance values exceeding 80% in the visible range, showing the potential of polycrystalline Ta:TiO2 for application as a transparent electrode in novel photovoltaic devices. The presence of trends in the structural (crystalline domain size, anatase cell parameters), electrical (resistivity, charge carrier density and mobility) and optical (transmittance, optical band gap, effective mass) properties as a function of the oxygen background pressures and laser fluence used during the deposition process and of the annealing atmosphere is discussed, and points towards a complex defect chemistry ruling the material behavior. The large mobility values obtained in this work for Ta:TiO2 polycrystalline films (up to 13 cm2V-1s-1) could represent a definitive advantage with respect to the more studied Nb-doped TiO2.
机译:我们提供了对多晶透明导电Ta掺杂的TiO2薄膜的详细研究,该薄膜是通过室温脉冲激光沉积,然后在550°C的真空中进行退火处理而获得的。为了评估材料结构和功能特性(即电导率和光学透明性)之间的关系,探索了Ta作为掺杂元素以及不同合成条件的影响。我们表明,对于掺杂的样品,可以实现低电阻率(5×10-4Ωcm的量级),并且在可见光范围内的透射率值超过80%,显示出多晶Ta:TiO2的潜在应用新型光伏器件中的透明电极。结构(晶域尺寸,锐钛矿晶胞参数),电学(电阻率,电荷载流子密度和迁移率)和光学(透射率,光学带隙,有效质量)特性随氧气本底压力和激光变化的趋势讨论了在沉积过程和退火气氛中使用的能量密度,并指出了决定材料性能的复杂缺陷化学。在这项工作中获得的Ta:TiO2多晶膜(高达13 cm2V-1s-1)的大迁移率值相对于研究更多的Nb掺杂TiO2而言,可以显示出一定的优势。

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