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Anomalous Hall effect scaling in ferromagnetic thin films

机译:铁磁薄膜中的霍尔效应反常缩放

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摘要

We propose a scaling law for anomalous Hall effect in ferromagnetic thin films. Our approach distinguishes multiple scattering sources, namely, bulk impurity, phonon for Hall resistivity, and most importantly the rough surface contribution to longitudinal resistivity. In stark contrast to earlier laws that rely on temperature- and thickness-dependent fitting coefficients, this scaling law fits the recent experimental data excellently with constant parameters that are independent of temperature and film thickness, strongly indicating that this law captures the underlying physical processes. Based on a few data points, this scaling law can even fit all experimental data in full temperature and thickness range. We apply this law to interpret the experimental data for Fe, Co, and Ni and conclude that (i) the phonon-induced skew scattering is unimportant as expected; (ii) contribution from the impurity-induced skew scattering is negative; (iii) the intrinsic (extrinsic) mechanism dominates in Fe (Co), and both the extrinsic and intrinsic contributions are important in Ni.
机译:我们针对铁磁薄膜中的异常霍尔效应提出了定标律。我们的方法区分了多种散射源,即体杂质,声子的霍尔电阻率,最重要的是粗糙表面对纵向电阻率的贡献。与依赖于温度和厚度的拟合系数的早期定律形成鲜明对比的是,该定标定律非常适合最近的实验数据,其恒定参数与温度和膜厚无关,强烈表明该定律捕获了潜在的物理过程。基于一些数据点,该缩放定律甚至可以在整个温度和厚度范围内拟合所有实验数据。我们应用该定律来解释Fe,Co和Ni的实验数据,并得出以下结论:(i)声子引起的偏斜散射不像预期的那样重要; (ii)杂质引起的偏斜散射的贡献为负; (iii)内在(外在)机理在铁(钴)中占主导地位,外在和内在的贡献在镍中都很重要。

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