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Propriétés de transport et d'anisotropie de jonctions tunnel magnétiques perpendiculaires avec simple ou double barrière

机译:具有单或双势垒的垂直磁性隧道结的输运和各向异性

摘要

Due to their advantageous properties in terms of data retention, storage density and critical current density for Spin Transfer Torque (STT) switching, the magnetic tunnel junctions with perpendicular anisotropy have become predominant in the developments for MRAM applications. The aim of this thesis is to improve the anisotropy and transport properties of such structures and to realize even more complex stacks such as perpendicular double junctions. Studies on the magnetic properties and Tunnel MagnetoResistance (TMR) measurements showed that to optimize the performances of the junctions, all the thicknesses of the different layers constituting the stack have to be adapted. To guaranty both a large TMR as well a strong perpendicular anisotropy, compromises are most of the time needed. Studies as a function of magnetic thickness enabled to extract the saturation magnetization, the critical thickness and the magnetic dead layer thickness both in the bottom reference and the top storage layer in structures capped with Ta. This type of junction could be tested electrically after patterning the sample into nanopillars. Knowing that perpendicular anisotropy mostly arises at the metal/oxide interface, the Ta capping layer was replaced by a MgO one, leading to a huge increase in the anisotropy of the free layer. A second top reference was then added on such a stack to create functional perpendicular double junctions. CoFeB/insertion/CoFeB synthetic antiferromagnetic storage layers could be developed and were proved to be stable enough to replace the standard Co/Pt-based reference layers.
机译:由于其在自旋传递转矩(STT)切换的数据保留,存储密度和临界电流密度方面的优势,在MRAM应用的开发中,具有垂直各向异性的磁隧道结已成为主流。本文的目的是改善这种结构的各向异性和传输特性,并实现更复杂的堆叠,例如垂直双结。对磁性能和隧道磁阻(TMR)测量的研究表明,要优化结的性能,必须调整构成堆栈的不同层的所有厚度。为了保证大的TMR和强的垂直各向异性,大多数时候都需要折衷解决。作为磁性厚度的函数进行研究,能够提取出以Ta覆盖的结构的底部参考层和顶部存储层中的饱和磁化强度,临界厚度和磁死层厚度。在将样品图案化为纳米柱后,可以进行电气测试。知道垂直各向异性主要发生在金属/氧化物界面,所以用MgO代替了Ta盖层,导致自由层的各向异性大大增加。然后在此堆栈上添加第二个顶部参考,以创建功能垂直的双结。可以开发CoFeB /插入/ CoFeB合成反铁磁存储层,并证明其足够稳定,可以替代基于Co / Pt的标准参考层。

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    Cuchet Léa;

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  • 年度 2015
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