Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques

摘要

Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters, 88(22), 223111, 2006 and may be found at http://dx.doi.org/10.1063/1.2209208