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Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heating

机译：具有旋转基板的致密，硬度低应力Ti0.40Al0.27w0.33N纳米复合膜的生长，旋转基板和没有外部基板加热

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Zhengtao Wu; Olof Tengstrand; Babak Bakhit; Jun Lu; J. E. Greene; Lars Hultman; Ivan Petrov; Grzegorz Greczynski;
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年度 2020
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2. Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias [J] . M. Lattemann, U. Helmersson, J.E. Greene Thin Solid Films . 2010,第21期

机译：在没有基板加热和偏压的情况下生长的全致密，无刻面的111纹理高功率脉冲磁控溅射TiN膜
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4. Effects of the substrate on the determination of hardness of thin films by the nanoscratch and nanoindentation techniques: A comparative study for the cases of soft film on hard substrate and hard film on soft substrate [C] . Noureddine Tayebi, Andreas A. Polycarpou, Thomas F. Conry Symposium on Thin Films - Stresses and Mechanical Properties X; 20031201-20031205; Boston,MA; US . 2003

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Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heating

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