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Compact Modeling of the Current through Nanoscale Double-Gate MOSFETs.

机译:通过纳米级双栅极MOSFET的电流的紧凑建模。

摘要

In this thesis a compact drain current model for nanoscale double-gate MOSFETs is presented. The model covers all operation regimes and bias voltages up to 0.4V. The modeling is done using conformal mapping techniques to solve the 2D Laplace equation in sub-threshold, and using a long channel model in strong-inversion. In near threshold, a quasi-Fermi level model which uses empirical constants is used to find the current. A continuous model is found by expressing asymptotes in the sub-threshold and strong inversion regimes, and combining them using a interpolation function. The interpolation function uses a parameter that is decided analytically from the near threshold calculations. The model shows good agreement with numerical simulations for bias voltages below 0.4V and channel lengths bellow 50nm.
机译:本文提出了一种用于纳米级双栅MOSFET的紧凑漏极电流模型。该模型涵盖了所有工作模式和高达0.4V的偏置电压。使用共形映射技术求解亚阈值下的二维Laplace方程,并在强反演中使用长通道模型进行建模。在接近阈值时,使用经验常数的准费米能级模型用于找到电流。通过在亚阈值和强反演体制中表达渐近线,并使用插值函数将它们组合起来,可以找到一个连续模型。插值函数使用从近阈值计算中解析得出的参数。对于低于0.4V的偏置电压和低于50nm的沟道长度,该模型与数值模拟显示出良好的一致性。

著录项

  • 作者

    Holen Åsmund;

  • 作者单位
  • 年度 2009
  • 总页数
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类

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