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Semiconductor Measurement Technology: Automatic Determination of the Interstitial Oxygen Content of Silicon Wafers Polished on Both Sides

机译:半导体测量技术:自动测定双面抛光硅晶片的间隙氧含量

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The Special Publication contains FORTRAN and PASCAL computer programs which implement an ASTM test method for the automatic determination of the interstitial oxygen content of silicon. The programs are to be used as illustrative examples by programmers wishing to implement the ASTM algorithm on their computers. The Publication also includes sample data that can be used to test the computer programs. The sample data are included in two forms: in print, and on an MS-DOS floppy disk.

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