Cryogenic xenon droplets for advanced lithography

机译：用于高级光刻的低温氙液滴

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A cryogenic xenon droplet production system for use in anadvanced laser plasma source for x-ray lithography has been designed, fabricated, and tested at ORNL. The droplet generator is based on proven (ink jet printer) drop-on-demand.

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作者
Gouge, M. J. ; Fisher, P. W.;
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年度 1996
页码 1-3
总页数 3
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Masking; X-Ray Sources; Cryogenics; Droplets; X Radiation; Xenon; Meetings;

机译：掩蔽; X射线源;低温学;液滴; X辐射;氙;会议;

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1. Uniform droplets benefit advanced particulates: collaborative research into controlled solidification using uniform alloy droplets offers benefits for the processing of advanced materials [J] . Craig A. Blue, Teiichi Ando, Jung-Hoon Chun Metal Powder Report . 1999,第3期

机译：均匀的液滴有益于先进的颗粒：使用均匀的合金液滴对受控凝固的合作研究为先进材料的处理带来了好处
2. Xenon Discharge-Produced Plasma Radiation Source for EUV Lithography [J] . Zhang C. H., Lv P., Zhao Y. P., Industry Applications, IEEE Transactions on . 2010,第4期

机译：用于氙气放电的氙气放电等离子体辐射源
3. Effect of xenon bombardment on ruthenium-coated grazing incidence collector mirror lifetime for extreme ultraviolet lithography [J] . Martin Nieto, Jean-Paul Allain, Vladimir Titov, Journal of Applied Physics . 2006,第5期

机译：氙轰击对钌涂层掠入射入射收集器镜寿命的影响，用于极端紫外光刻
4. Fundamental Study of Droplet Spray Characteristics in Photomask Cleaning for Advanced Lithography [C] . C.L. Lu, C.H. Yu, W.H. Liu, Conference on photomask technology . 2011

机译：用于高级光刻的光掩模清洗中的液滴喷雾特性的基础研究
5. The Cryogenic Infrastructure of the Xenon1T Dark Matter Experiment: From Design to Performance During the One Ton-Year WIMP Search [D] . Zhang, Yun. 2021

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6. Hybrid soft-lithography/laser machined microchips for the parallel generation of droplets [O] . M. Muluneh, D. Issadore -1

机译：混合软光刻/激光加工的微芯片可并行产生液滴
7. Status of the liquid-xenon-jet laser-plasma source for EUV lithography [O] . Björn A. M. Hanssona, Lars Rymella, Magnus Berglunda, 2015

机译：用于EUV光刻的液体 - 氙 - 射流激光 - 等离子体源的现状

Cryogenic xenon droplets for advanced lithography

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