Development of XRMF techniques for measurement of multi-layer film thicknesses on semiconductors for VLSI and ULSI integrated circuits. Final CRADA report for CRADA number Y-1292-0130

摘要

A CRADA with Kevex Instruments was carried out to develop improved XRMF instrumentation for the nondestructive analysis of electronic components during manufacture. Experiments conducted at Y-12 proved the feasibility of a new Kevex x-ray tube design. Tests also show that the current commercial supply of straight glass capillaries is unreliable; however, other vendors of tapered single and multiple glass capillaries were identified. The stability of the Y-12 x-ray microprobe was significantly enhanced as a result of this CRADA.