首页> 美国政府科技报告 >Novel RF-Plasma System for the Synthesis of Ultrafine, Ultrapure SiC and Si sub 3 N sub 4
【24h】

Novel RF-Plasma System for the Synthesis of Ultrafine, Ultrapure SiC and Si sub 3 N sub 4

机译:用于合成超细,超纯siC和si sub 3 N sub 4的新型RF等离子体系统

获取原文

摘要

A novel high-temperature plasma tube has been developed that overcomes the meltdown problem of the conventional water- and gas-cooled quartz plasma tubes commonly used. The key feature of this system is the placement of heavy-walled, water-cooled copper fingers inside a quartz mantle to shield the mantle from the intense radiation of the plasma. The copper fingers act as transformers to couple the plasma to the applied rf field. This system has been used to produce ultrafine, ultrapure silicon carbide powder by reaction of silane and methane. Powder of beta -SiC has been obtained with a BET surface area of > 160 m exp 2 /g and a particle size range of 10 to 20 nm. Likewise, powder of silicon nitride has been synthesized by reaction of silane and ammonia in the plasma. The resulting powder is approximately 50% Si sub 3 N sub 4 with a mixture of alpha - and beta -polymorphic forms. Boron carbide has also been successfully synthesized from diborane and methane. (ERA citation 09:006216)

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号