High Index of Refraction Films for Dielectric Mirrors Prepared by Metal-Organic Chemical Vapor Deposition.

摘要

A wide variety of metal oxides with high index of refraction can be prepared by Metal-Organic Chemical Vapor Deposition. We present some recent optical and laser damage results on oxide films prepared by MOCVD which could be used in a multilayer structure for highly reflecting (HR) dielectric mirror applications. The method of preparation affects both optical properties and laser damage threshold. 10 refs., 8 figs., 4 tabs. (ERA citation 14:023875)