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High-performance multilayer mirrors for soft x-ray projection lithography.

机译：用于软X射线投影光刻的高性能多层反射镜。

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We present a comparative study of three metal-Si multilayer coatings, Mo-Si, Ru-Si and Rh-Si, designed for optimum normal incidence reflectivity at x-ray wavelengths near 130 (Angstrom). The ML structures are characterized using x-ray diffraction and high ...

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作者
D. G. Stearns R. S. Rosen S. P. Vernon;
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年度 1991
页码 1-16
总页数 16
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Deposition; EDB/360101; EDB/360104; Electron Microscopy; Lithography; Microstructure; Mirrors; Molybdenum; Multilayers; Optics; Reflective Coatings; Reflectivity; Rhodium; Ruthenium; Silicon; X-Ray Diffraction;

机译：沉积; EDB / 360101; EDB / 360104;电子显微镜;光刻;微结构;镜子;钼;多层;光学;反射涂层;反射率;铑;钌;硅; X射线衍射;

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专利

1. Study of Cr/Sc-based multilayer reflecting mirrors using soft x-ray reflectivity and standing wave-enhanced x-ray fluorescence [J] . Meiyi Wu, Catherine Burcklen, Jean-Michel Andre, Optical engineering . 2017,第11期

机译：基于软X射线反射率和驻波增强X射线荧光的Cr / Sc基多层反射镜研究
2. Characterization of Mo/Si soft X-ray multilayer mirrors by grazing-incidence small-angle X-ray scattering [J] . Siffalovic P, Majkova E, Chitu L, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2009,第1期

机译：通过掠入射小角X射线散射表征Mo / Si软X射线多层反射镜
3. Multilayer X-ray Interference Mirrors in the Ultrasoft X-ray Region [J] . I.I.Lyakhovskaya, E.A.Bugaev Journal of Electron Spectroscopy and Related Phenomena . 1996,第期

机译：Ultrasoft X射线区域中的多层X射线干涉镜
4. High-performance multilayer mirrors for soft x-ray projection lithography [C] . Daniel G. Stearns, Robert S. Rosen, Stephen P. Vernon Conference on multilayer optics for advanced x-ray applications . 1992

机译：用于软X射线投影光刻的高性能多层镜
5. Optical constants of materials in the EUV/soft x-ray region for multilayer mirror applications. [D] . Soufli, Regina. 1997

机译：用于多层反射镜的EUV /软X射线区域中材料的光学常数。
6. Nanofocusing of X-ray free-electron laser using wavefront-corrected multilayer focusing mirrors [O] . S. Matsuyama, T. Inoue, J. Yamada, -1

机译：使用波前校正的多层聚焦镜对X射线自由电子激光进行纳米聚焦
7. Laser-induced Plasma X-ray Source and Its Applications. Development of Laser-plasma Soft X-ray Source for Projection Lithography. [O] . Yasuhiko NISHIMURA, Atsushi SAKATA, Hirozumi AZUMA 1999

机译：激光诱导等离子体X射线源及其应用。投影光刻激光等离子软X射线源的研制。
8. X-ray characterization of a three-element condenser system for soft x-ray projection lithography. [R] . Gaines, D. P., Sommargren, G. E., Vernon, S. P., 1993

机译：用于软X射线投影光刻的三元件冷凝器系统的X射线表征。

High-performance multilayer mirrors for soft x-ray projection lithography.

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