Mobility of electrons and holes in semiconductors

摘要

The mobility of electrons and holes is calculated in silicon as a function of temperature and the concentration of impurities. Calculations are done for both majority and minority carriers. Special care has been taken in the calculation of the contribution from impurity scattering. Both the dielectric function, and the local field corrections, have been calculated as a function of temperature and impurity concentration. The results agree with the data at low temperature, and at high doping at room temperature.