Dielectrics; Epitaxial growth; Nickel; Breakdown(electronic threshold); Buffers; Coercive force; Compressive properties; Conductivity; Dielectric strength; Electron microscopy; Ferroelectric materials; Foils(materials); Low power; Nonlinear systems; Oxides; Polycrystalline; Pulsed lasers; Residual stress; Silicon; Tensile stress; Thin films; Tuning; Weibull density functions; X ray diffraction; Nickel film growth; Growth x-ray diffraction; Dielectric thin films; Pe611102a;
机译:外延Pb_(0.92)La_(0.08)Zr_(0.52)Ti_(0.48)O_3薄膜的介电非线性增强
机译:弛豫铁电体Pb0.92La0.08Zr0.52Ti0.48O3薄膜的温度相关介电非线性
机译:弛豫铁电体Pb_(0.92)La_(0.08)Zr_(0.52)Ti_(0.48)O_3薄膜的温度相关介电非线性
机译:外延PB(Zr {sub} 0.52Ti {sub} 0.48)O {sub} 3 / la {sub} 0.7(Pb,SR){sub} 0.3mno {sub} 3铁电/ CMR内存优化为室温操作
机译:镧锶锰(LA0.67SR0.33MNO3)和锆钛酸铅(PBZR0.52TI0.48O3)薄膜异质结构中的自极化感应磁电耦合
机译:Pb(Zr0.52Ti0.48)O3铁电纳米晶体的原位极化和介电性能测量
机译:增强外延PB0.92LA0.08ZR0.52TI0.48O3薄膜中的增强介电非线性