Development of Y-BA-CU-O Coated Conductor Using Metal Organic Chemical Vapor Deposition

摘要

The objective of the program is to develop a fundamental understanding of YBCO film deposition by Metal Organic Chemical Vapor Deposition (MOCVD) on biaxially-textured metal substrates. In comparison to other vapor deposition techniques, MOCVD offers the advantages of rapid deposition rates, film uniformity over large areas, and is not limited to line-of-sight deposition. The program includes a study of the (a) influence of MOCVD processing conditions such as the flow rate of precursor vapors, precursor vaporization temperatures, oxygen partial pressure, reactor pressure, and the deposition temperature on the film features such as superconducting phase formation, composition, texture, deposition rates, uniformity in thickness, porosity and the presence of secondary phases, (b) relationship between film microstructure and the critical current density (Jc), and (c) influence of metal substrate and buffer layers on the growth and performance of YBCO.