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A DUAL CELL PLATING APPARATUS FOR DEPOSITION OF MULTI-LAYER METAL SYSTEMS

机译:一种用于沉积多层金属系统的双电池电镀设备

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摘要

An experimental dual cell apparatus for the electro-deposition of alternating metal layers (binary systems) employing a rotating cathode is described. Microstructures of multi-layered systems of Ni-Cu and Ni-Fe are shown and some of their properties are discussed and evaluated. X-ray diffraction data on the behavior of the Ni-Cu systems is given. Also shown is the multi-layered Ni-Cr microstructure. . Data compiled has shown that: lamellar structures exhibit increasing hardness and smoothness with decreasing thickness of single constituent layers (approximate layer thickness range 23,000 to 60 angstroms);fine grained and fairly pure multi-layered structures are rapidly produced;bulk multi-layered structures of Ni-Cu consisting of uniform and extremely thin layers, exhibited some inter diffusion (as plated), as evidenced by x-ray diffraction patterns;x-ray dif fraction data also shows complete inter diffusion of Ni-Cu multi-layers when treated at relatively low temperature and time.

著录项

  • 作者

    V. P. GRECO;

  • 作者单位
  • 年度 1963
  • 页码 1-39
  • 总页数 39
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工业技术;
  • 关键词

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