首页> 美国政府科技报告 >Development of Design Parameters and Conceptual Drawing for a Plasma Etcher to Clean and Sterilize Surgical Instruments. Phase 1.
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Development of Design Parameters and Conceptual Drawing for a Plasma Etcher to Clean and Sterilize Surgical Instruments. Phase 1.

机译:等离子蚀刻机清洗和消毒手术器械的设计参数和概念图的开发。阶段1。

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The proposed process will use accelerated ions to remove organic matter by physically desorbing molecular fragments and by reacting chemically to produce volatile non-toxic gases such as C02. Work performed includes the determination of the optimal size of the process chamber and how surgical instruments can most effectively be arranged in it; the optimal pressure inside the chamber; the required power density; evaluation of alternative power sources and generation of design parameters and a conceptual drawing of the proposed etcher. Feasibility of both cleaning and sterilization are demonstrated in this study.... Medical facilities, Equipment and supplies, Ion plasma.

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