Application of X-ray Nanolithography to the Fabrication of OptoelectronicIntegrated Circuits

摘要

As a result of the research carried out under this grant, we have laid thefoundation for an entirely new approach to high performance optoelectronic components for all optical networks utilizing wavelength division multiplexing We have developed both the required nanofabrication technology and the basic components. This work will be continued and expanded under DARPA sponsored MURI funding. New grating based components that promise even higher performance than those described here have recently been conceived, something that would not have occurred except for this grant. These more advanced components will be pursued under the MURI program which will commence in early 1996.