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Transmission electron microscopy of amorphization and phase transformation beneath indents in Si

机译:硅压痕下非晶化和相变的透射电子显微镜

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The microstructure beneath indents, with three different tip shapes (spherical. Vickers and Berkovich), in Si was examined using transmission electron microscopy. The focused-ion beam technique was applied to the preparation of specimens for cross-sectional observation. Activation of dislocations, cracking, phase transformation and amorphization were observed. [References: 21]
机译:使用透射电子显微镜检查了硅中具有三种不同尖端形状(球形,维氏和贝尔科维奇)的凹痕下方的微观结构。聚焦离子束技术被应用于制备用于横截面观察的样品。观察到位错的活化,裂纹,相变和非晶化。 [参考:21]

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