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d~0 Ferromagnetism in undoped ZnO thin films: Effect of thickness, interface and oxygen annealing

机译:未掺杂的ZnO薄膜中的d〜0铁磁性:厚度,界面和氧退火的影响

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摘要

We present a systematic study of the thickness dependency of the structural, electrical and magnetic properties of undoped ZnO thin films. The highest saturation moment (~36.75 emu cm~(-3)) was observed for the thinnest films. Both the undoped and 5% Co doped ZnO films of different thickness (0.066-1.1 μm) showed a diamagnetic behavior upon annealing in oxygen. Activation energy of quenching of ferromagnetism revealed oxygen vacancies as the key mediating defect in ferromagnetic ZnO thin films.
机译:我们目前对未掺杂的ZnO薄膜的结构,电学和磁学性质的厚度依赖性进行系统研究。对于最薄的膜,观察到最高的饱和力矩(〜36.75 emu cm〜(-3))。不同厚度(0.066-1.1μm)的未掺杂和5%Co掺杂的ZnO薄膜在氧气中退火后均表现出抗磁性能。铁磁淬火的活化能表明氧空位是铁磁ZnO薄膜的关键介导缺陷。

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