The effect of residual hydrogen on hydrogenation behavior of titanium thin films

摘要

The effect of residual hydrogen, sorbed during the deposition process, on the hydrogenation behavior of ion-beam sputtered tita-nium thin films was investigated. Electromotive force and in situ stress measurements were conducted to study hydrogen absorption, phase boundaries and hydrogen-induced stress development in the Ti-H thin film system. Tests were conducted on both as-sputtered and previously discharged films; the effect of residual hydrogen is significantly manifested in the thermodynamic isotherms and stress-concentration curves.