首页> 外文期刊>Modern Physics Letters, B. Condensed Matter Physics, Statistical Physics, Applied Physics >Conductive copper sulfide thin films on polyimide foils for optical and optoelectronic applications
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Conductive copper sulfide thin films on polyimide foils for optical and optoelectronic applications

机译:用于光学和光电应用的聚酰亚胺箔上的导电硫化铜薄膜

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Copper sulfide thin films of 75 nm and 100 mn thickness were coated on Kapton foils (PI) of 25 mn thickness by floating them on a chemical bath. The foils were annealed at 150 degreesC-400 degreesC in N-2 converting the coating from CuS to Cu1.8S. The sheet resistance of the annealed coatings (100 nm) is 10-50 ohms/square which is almost unaltered after immersion in dilute HCl for 30-120 min. The infrared reflectance predicted for the coatings is 67%-77% at a wavelength 2.5 mum, which is nearly what is experimentally observed. The coated PI has a transmittance (25-35%) peak located around 550-600 nm. These thermally stable conductive coatings on PI foils might be used as conductive substrates for optoelectronic device structures. [References: 6]
机译:通过将75纳米厚和100百万厚度的硫化铜薄膜浮在化学浴上,将其涂覆在25纳米厚的Kapton箔(PI)上。将箔在N-2中在150摄氏度至400摄氏度的温度下退火,从而将涂层从CuS转变为Cu1.8S。退火涂层(100 nm)的薄层电阻为10-50欧姆/平方,在稀HCl中浸泡30-120分钟后几乎不变。在波长为2.5微米的情况下,涂层的红外反射率预计为67%-77%,这几乎是实验观察到的。涂覆的PI具有位于550-600nm附近的透射率(25-35%)峰。 PI箔片上的这些热稳定导电涂层可用作光电器件结构的导电基材。 [参考:6]

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