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Annealing effects on physical properties of doped CdTe thin films for photovoltaic applications

机译:退火对光生伏打应用掺杂CdTe薄膜物理性能的影响

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Polycrystalline Cadmium Telluride (CdTe) thin films were prepared on glass substrates by thermal evaporation at the chamber ambient temperature and then annealed for an hour in vacuum similar to 1 x 10(-5) mbar at 400 degrees C. These annealed thin films were doped with copper (Cu) via ion exchange by immersing these films in Cu (NO3)(2) solution (1 g/1000 ml) for 20 min. Further these films were again annealed at different temperatures for better diffusion of dopant species. The physical properties of an as doped sample and samples annealed at different temperatures after doping were determined by using energy dispersive x-ray analysis (EDX), x-ray diffraction (XRD), Raman spectroscopy, transmission spectra analysis, photoconductivity response and hot probe for conductivity type. The optical band gap of these thermally evaporated Cu doped CdTe thin films was determined from the transmission spectra and was found to be in the range 1.42-1.75 eV. The direct energy band gap was found annealing temperatures dependent. The absorption coefficient was > 10(4) cm(-1) for incident photons having energy greater than the band gap energy. Optical density was observed also dependent on postdoping annealing temperature. All samples were found having p-type conductivity. These films are strong potential candidates for photovoltaic applications like solar cells. (C) 2014 Elsevier Ltd. All rights reserved.
机译:通过在腔室环境温度下热蒸发在玻璃基板上制备多晶碲化镉(CdTe)薄膜,然后在类似于1 x 10(-5)mbar的真空中于400摄氏度下退火一小时。将这些退火薄膜进行掺杂通过将这些膜浸入Cu(NO3)(2)溶液(1 g / 1000 ml)中20分钟,通过离子交换与铜(Cu)进行反应。此外,这些膜再次在不同温度下退火,以更好地扩散掺杂物质。通过使用能量色散X射线分析(EDX),X射线衍射(XRD),拉曼光谱,透射光谱分析,光电导响应和热探针来确定掺杂样品和掺杂后在不同温度退火的样品的物理性质用于导电类型。由透射光谱确定这些热蒸发的Cu掺杂的CdTe薄膜的光学带隙,发现在1.42-1.75eV的范围内。发现直接能带隙与退火温度有关。对于能量大于带隙能量的入射光子,吸收系数> 10(4)cm(-1)。还观察到光密度还取决于掺杂后的退火温度。发现所有样品均具有p型导电性。这些薄膜是光伏应用(如太阳能电池)的强大潜在候选人。 (C)2014 Elsevier Ltd.保留所有权利。

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