Molecular Emission of CF_4 Gas in Low-pressure Inductively Coupled Plasma

摘要

CF4 gas is one of the most common chemicals used for dry etching in semiconductor manufacturing processes.For application to the etching process and environmental control,the low-pressure inductively coupled plasma (LP-ICP) was employed to obtain the spectrum of CF_4 gas.In terms of the analysis of the spectra,trace CF radical by A-X and B-X transitions was detected.The other CF_X radicals,such as CF_2 and CF_3,were not seen in this experiment whereas strong C and C_2 emissions,dissociation products of CF_4 gas,were observed.