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首页> 外文期刊>Electrochimica Acta >Electrochromic properties of porous NiO thin film as a counter electrode for NiO/WO_3 complementary electrochromic window
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Electrochromic properties of porous NiO thin film as a counter electrode for NiO/WO_3 complementary electrochromic window

机译:多孔NiO薄膜作为NiO / WO_3互补电致变色窗口对电极的电致变色特性

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摘要

Highly porous nickel oxide (NiO) thin films were prepared on ITO glass by chemical bath deposition (CBD) method. SEM results show that the as-deposited NiO film is constructed by many interconnected nanoflakes with a thickness of about 20 nm. The electrochromic properties of the NiO film were investigated in a nonaqueous LiClO_4-PC electrolyte by means of optical transmittance, cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) measurements. The NiO film exhibits a noticeable electrochromic performance with a variation of transmittance up to 38.6% at 550 nm. The CV and EIS measurements reveal that the NiO film has high electrochemical reaction activity and reversibility due to its highly porous structure. The electrochromic (EC) window based on complementary WO_3/NiO structure shows an optical modulation of 83.7% at 550nm, much higher than that of single WO_3 film (65.5% at 550 nm). The response time of the EC widow is found to be about 1.76 s for coloration and 1.54 s for bleaching, respectively. These advantages such as large optical modulation, fast switch speed and excellent cycle durability make it attractive for a practical application.
机译:采用化学浴沉积(CBD)方法在ITO玻璃上制备了高孔隙度的氧化镍(NiO)薄膜。 SEM结果表明,沉积的NiO薄膜是由许多相互连接的纳米薄片构成的,其厚度约为20 nm。通过光学透射率,循环伏安法(CV)和电化学阻抗谱(EIS)测量,在非水LiClO_4-PC电解质中研究了NiO膜的电致变色性能。 NiO膜表现出明显的电致变色性能,在550 nm处的透射率变化高达38.6%。 CV和EIS测量表明,由于NiO膜具有高度的多孔结构,因此具有很高的电化学反应活性和可逆性。基于互补WO_3 / NiO结构的电致变色(EC)窗口在550nm处显示83.7%的光调制,远高于单个WO_3膜(在550 nm处65.5%)的光调制。发现EC寡妇的响应时间分别为大约1.76 s(着色)和1.54 s(漂白)。这些优点,例如大的光学调制,快速的开关速度和出色的循环耐久性,使其对于实际应用具有吸引力。

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