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Saturated low-temperature conductivity in ultrafast semiconductor nanocomposites

机译:超快半导体纳米复合材料中的饱和低温电导率

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This Letter presents studies on low-field electrical conduction in the range of 4-300 K for an ultrafast material, i.e., InGaAs:ErAs grown by molecular beam epitaxy. The unique properties include nano-scale ErAs crystallites in the host semiconductor InGaAs, a deep Fermi level and picosecond ultrafast photocarrier recombination. As the temperature drops, the conduction mechanisms are in the sequence of:thermal activation, nearest-neighbor hopping, and variablerange hopping. In the low-temperature limit, finite-conductivity metallic behavior, not insulating, was observed. This unusual conduction behavior, related to the nanometerscale ErAs crystallite islands, is explained with the Abrahams scaling theory. Current vs. temperature for (A) InGaAs:ErAs - the ultrafast nanocomposite; and (C) an undoped InGaAs.
机译:这封信介绍了对超快材料(即通过分子束外延生长的InGaAs:ErAs)在4-300 K范围内的低场电传导的研究。其独特特性包括主体半导体InGaAs中的纳米级ErAs微晶、深费米能级和皮秒超快光载流子复合。随着温度的下降,传导机制依次为:热活化、最近邻跳跃和变程跳跃。在低温极限下,观察到有限电导率金属行为,而不是绝缘。这种不寻常的传导行为与纳米尺度的ErAs微晶岛有关,可以用亚伯拉罕缩放理论来解释。(A) InGaAs:ErAs - 超快纳米复合材料的电流与温度的关系;(C)未掺杂的InGaAs。

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