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机译:表面粗糙度对应变SiGe异质结从二维到三维生长模式变化的影响
Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 603950, Russia;
机译:Transport properties of two-dimensional electron gas in a strained-Si/SiGe heterostructure at low carrier densities
机译:Microscopic analysis of voltage noise operation mode in SiGe/Si bipolar heterojunctions: Influence of the SiGe strained layer
机译:Effect of metal-oxide-semiconductor processing on the surface roughness of strained Si/SiGe material