The pressure dependence of the thermal diffusion factors of the systems Hendash;nndash;propane, Hendash;octafluorocyclobutane (C4F8), and CH4ndash;C4F8at 300 K

摘要

Thermal diffusion factors, agr;T, are reported for the systems Hendash;nC3H8, Hendash;C4F8, and CH4ndash;C4F8at 300 K as functions of concentration and pressure; excess second virial coefficients are also reported for each system. The agr;Tvalues are extrapolated to zero pressure and the theory of Oost, Los, Cauwenbergh, and van Dael is used to predict the pressure dependence of agr;Tat each concentration for comparison with the experimental results. The data for CH4ndash;C4F8do not agree with the theory.