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首页> 外文期刊>journal of chemical physics >The dynamics of surface rearrangements in Si adatom diffusion on the Silcub;100rcub;(2times;1) surface
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The dynamics of surface rearrangements in Si adatom diffusion on the Silcub;100rcub;(2times;1) surface

机译:The dynamics of surface rearrangements in Si adatom diffusion on the Silcub;100rcub;(2times;1) surface

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The Si adatom adsorption and diffusion on the fully relaxed Silcub;100rcub;(2times;1) surface is studied by a combination of molecular dynamics simulations with Tersoffrsquo;s potential for the Si interactions, a simplified transition state theory of Voter and lattice gas simulations. Six local minima for adsorption are found on the surface and the activation energies between each are determined. The Arrhenius behavior for the macroscopic diffusion is found to beD=5.67times;10minus;3exp(minus;0.75 eV/kT) cm2/s. In addition, it is found that the adatom diffusion is strongly anisotropic in nature and the direction of easy diffusion is perpendicular to the dimers (i.e., parallel to the dimer rows) of the original surface. The minimum energy path for the diffusion is found to be activated by the local unreconstruction (dimer opening) of the otherwise fully reconstructed surface.

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