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Impurity gradients caused by surface states and substrate doping in epitaxial GaAs

机译:Impurity gradients caused by surface states and substrate doping in epitaxial GaAs

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摘要

A model is developed for the incorporation of donors and acceptors in epitaxial GaAs which indicates that the thinphyphen;type region often observed at the layerhyphen;substrate interface innminus;p+ structures is caused by the electric field associated with surface states and substrate doping. The model also predicts impurity gradients at the outer surface, about which little is known experimentally. Since results from the model are in agreement with many experimental observations, surface states and substrate doping are believed to be the major cause of impurity gradients in epitaxial GaAs.

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  • 来源
    《applied physics letters》 |1977年第5期|356-359|共页
  • 作者

    C. M. Wolfe; K. H. Nichols;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

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