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机译:Atomic layer deposition of SiO2 at room temperature using NH3-catalyzed sequential surface reactions
Univ Colorado, Dept Chem & Biochem, Campus Box 215, Boulder, CO 80309, USA.;
Amorphous thin films; Ellipsometry; Growth; Infrared absorption spectroscopy; Insulating films; Silicon oxides; Surface chemical reaction; Surface structure; morphology; roughness; and topography; Chemical-vapor-deposition; Binary reaction sequence; Conjugated polymers; Controlled growth; Thin-films; Epitaxy; Chemistry; Silica; Dioxide;