Quantitative analysis of interfacial impurities using secondaryhyphen;ion mass spectrometry

摘要

A new secondaryhyphen;ion mass spectrometry technique is described which permits quantitative analysis of impurities at buried interfaces. The technique utilizes the cascade mixing which accompanies sputtering to mix, and dilute, interfacial impurities into the surrounding matrix to such an extent that ion yields through the interface region are constant and characteristic of the matrix. Comparison with ionhyphen;implanted standards then yields analyses accurate to better than 30percnt; (limited by knowledge of the standards) with a statistical uncertainty of 2percnt;.