X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) analysis of UV- exposed polystyrene

摘要

The surface photochemistry of polystyrene is shown to exhibit features that distinguish it from the bulk and from the polymer in solution. We report on the use of medium- and high-resolution time-of-flight secondary ion mass spectrometry and X-ray photoelectron spectroscopy in an investigation of the changes that occur as a result of exposure to UV light from a 'black lamp' source. The experiment mimics closely the effects of natural sunlight. It is shown that there are substantial changes occurring in the surface molecular structure of polystyrene on irradiation, which correspond to loss of aromaticity, and that these changes precede any uptake of oxygen.