The present disclosed subject mutter relates to apparatus for and methods of obtaining and displaying measurement information in a lithographic apparatus and process.A lithographic apparatus applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used,for example, in the manufacture of integrated circuits (ICs). In such a case, a patterning device, which is alternatively referred to as a mask or reticle, may be used to generate a circuit pattern to be formed on an individual layer of the IC This pattern can be transferred onto a target portion (e.g. part of a die, one die, or several dies) on a substrate (e.g. a silicon wafer).Pattern transfer is typically accomplished by imaging onto a layer of radiation-sensitive material (resist) provided on the substrate. In general, a single substrate will contain a network of adjacent target portions that are successively patterned.
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