State of the art: model scanner interface based on pre-defined fingerprint description, e.g k-parameters. Problems: Fixed model does not allow use of better suited fingerprint models which could make better use of correction potential scanner. Solution: 'plug-in' correction fingerprint model interface allowing specification, configuration and utilization of any fingerprint model on the scanner, and in customer correction handling systems. The solution consists of: a description and an implementation of an abstract application binary interface (ABI) on the lithographic machine; a description of a method to create a concrete binary implementation of that abstract interface - the 'plug-in'. A mechanism to dynamically load, configure and execute the 'plug-in'. The k-parameter based correction fingerprint model could be implemented as a specific 'plug-in' for backward compatibility. Summary: A computer program comprising instructions configured to: receive a Blackbox model and associated Blackbox model parameters configured for determining a distribution of one or more to be controlled parameters across a substrate based on inputting process coordinates associated with a temporal and/or spatial variation of a process to which the substrate is subject; evaluate the Blackbox model at the process coordinates using the Blackbox model parameters; and configure the process based on the evaluation. Optionally a step of verifying the integrity of the received Blackbox model parameters data may be implemented. Optionally the Blackbox model is a plugin, the distribution of to be controlled parameters is an overlay fingerprint and the spatial variation is related to one or more wafer coordinates, while the process is a lithographic process.
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