This research disclosure relates to a gas supply system and a method for supplying a gas. Especially, it relates to a gas supply system comprising a membrane arranged to separate nitrogen and oxygen, herewith providing an oxygen deficient (or nitrogen enriched) gas. The gas supply system may be used to provide a gas to an optical system. The optical system may be arranged in a semiconductor manufacturing apparatus, which may be used in the manufacturing process of semiconductor devices, e.g., a lithographic exposure apparatus.In order to condition or to control an environment, for example a clean environment in an apparatus for use in (he manufacturing process of integrated circuits (ICs), a clean gas may be provided by a gas supply system. By providing the clean gas to the environment, the components and surfaces thereof can be kept clean, as a gas flow (created by the provided gas) may prevent airborne particles or contaminants to settle at the component surfaces. The environment may be flushed by the gas as provided by the gas supply system. A overpressure may be created in the environment, herewith preventing contaminants to reach the gas-controlled environment via an uncontrolled path.
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