The present invention relates to a method of determining one or more physical quantities and associated apparatus for carrying out the method. The one or more physical quantities may relate to e.g. alignment between an object plane and an image plane of the projection system. A lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate. A lithographic apparatus can he used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus may. for example, project a pattern (also often referred to as "design layout" or "design") of a patterning device (e.g.. a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate (e.g., a wafer).
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