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Grain size control in the fabrication of large single-crystal bilayer graphene structures

机译:晶粒尺寸控制在大型的制造单晶双层石墨烯结构

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摘要

Bilayer graphene (BLG) can provide a tunable band gap when exposed to a vertical electric field. We report here an approach to the synthesis of large single-crystal BLG structures with diameters up to 0.54 mm. We found that both absorption-diffusion and gas-phase penetration mechanisms contributed to the growth of the lower second layer and that the absorption-diffusion mechanism favors faster BLG growth. Our strategy was to suppress nucleation in the growth of the first layer using an established surface oxidation method to maintain a low coverage of graphene on Cu foil. We subsequently maximized the growth of the second layer by increasing the duration of absorption-diffusion. The chemical treatment used to polish the Cu surface to reduce the nucleation of growth in the monolayer increased the nucleation density during the growth of the second layer. Electron transport measurements on dual-gated field-effect transistors showed that the BLG fabricated was of high quality with a sizeable tunable band gap. Our approach may have broad applications for the controlled synthesis of bilayers in materials chemistry.
机译:双层石墨烯(BLG)可以提供一个可调的乐队差距暴露在一个垂直的电场。报告在一个大型的合成方法单晶BLG结构直径0.54毫米。absorption-diffusion和气相渗透导致较低的生长机制第二层,absorption-diffusion有利于更快的BLG增长机制。抑制成核生长的吗第一层用一个确定的表面氧化方法来保持低的报道石墨烯在铜铝箔。第二层通过增加的增长absorption-diffusion的持续时间。治疗用于波兰铜表面,以减少在单层的成核增长成核密度的增加第二层的增长。测量在dual-gated场效应晶体管显示BLG捏造的高质量的有相当大的可调带隙。我们的方法可能有广泛的应用影响材料的可控合成化学。

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