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In situ degradation studies of two-dimensional WSe2-graphene heterostructures

机译:二维的原位降解研究WSe2-graphene异质结构

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Heterostructures of two-dimensional materials can be vulnerable to thermal degradation due to structural and interfacial defects as well as thermal expansion mismatch, yet a systematic study does not exist in the literature. In this study, we investigate the degradation of freestanding WSe2-graphene heterostructures due to heat and charge flow by performing in situ experiments inside a transmission electron microscope. Experimental results show that purely thermal loading requires higher temperatures (>850 degrees C), about 150 degrees C higher than that under combined electrical and thermal loading. In both cases, selenium is the first element to decompose and migration of silicon atoms from the test structure to the freestanding specimen initiates rapid degradation through the formation of tungsten disilicide and silicon carbide. The role of the current flow is to enhance the migration of silicon from the sample holder and to knock-out the selenium atoms. The findings of this study provide fundamental insights into the degradation of WSe(2-)graphene heterostructures and inspire their application in electronics for use in harsh environments.
机译:异质结构的二维材料很容易热降解由于以及结构和界面缺陷热膨胀不匹配,但系统研究在文献中是不存在的。研究中,我们调查的退化独立式WSe2-graphene异质结构由于加热和电荷流进行原位实验在透射电子显微镜。热负荷需要更高的温度(> 850摄氏度),高出150摄氏度在电气和热相结合装载。元素硅的分解和迁移独立的原子从测试结构样品通过启动快速退化钨二硅化物和硅的形成硬质合金。提高迁移的硅样品持有人,淘汰赛硒原子。本研究的研究提供基础洞察WSe(2)石墨烯的降解异质结构,激励他们的应用程序电子在严酷的环境下使用。

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