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首页> 外文期刊>The Journal of Chemical Physics >Polyamorphism in vapor-deposited 2-methyltetrahydrofuran: A broadband dielectric relaxation study
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Polyamorphism in vapor-deposited 2-methyltetrahydrofuran: A broadband dielectric relaxation study

机译:气相沉积2-甲基四氢呋喃中的多晶晶:宽带介电松弛研究

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摘要

Depositing a simple organic molecular glass-former 2-methyltetrahydrofuran (MTHF) onto an interdigitated electrode device via physical vapor deposition gives rise to an unexpected variety of states, as revealed by dielectric spectroscopy. Different preparation parameters, such as deposition temperature, deposition rate, and annealing conditions, lead, on the one hand, to an ultrastable glass and, on the other hand, to a continuum of newfound further states. Deposition below the glass transition temperature of MTHF leads to loss profiles with shape parameters and peak frequencies that differ from those of the known bulk MTHF. These loss spectra also reveal an additional process with Arrhenius-like temperature dependence, which can be more than four decades slower than the main structural relaxation peak. At a given temperature, the time constants of MTHF deposited between 120 K and 127 K span a range of more than three decades and their temperature dependencies change from strong to fragile behavior. This polyamorphism involves at least three distinct states, each persisting for a duration many orders of magnitude above the dielectric relaxation time. These results represent a significant expansion of a previous dielectric study on vapor deposited MTHF [B. Riechers et al., J. Chem. Phys. 150, 214502 (2019)]. Plastic crystal states and the effects of weak hydrogen bonding are discussed as structural features that could explain these unusual states.
机译:介电光谱显示,通过物理气相沉积将简单的有机分子玻璃前体2-甲基四氢呋喃(MTHF)沉积到叉指电极器件上会产生意想不到的状态变化。不同的制备参数,如沉积温度、沉积速率和退火条件,一方面导致超稳定玻璃,另一方面导致新发现的进一步状态的连续性。低于MTHF玻璃化转变温度的沉积导致损耗曲线的形状参数和峰值频率与已知的大块MTHF不同。这些损耗谱还揭示了一个类似阿累尼乌斯温度依赖性的额外过程,该过程可能比主要结构弛豫峰慢40多年。在给定的温度下,在120 K和127 K之间沉积的MTHF的时间常数跨度超过30年,其温度依赖性从强到脆弱的行为变化。这种多态性至少涉及三种不同的状态,每种状态的持续时间比介电弛豫时间高出许多数量级。这些结果代表了之前对气相沉积MTHF电介质研究的重大扩展[B.Riechers等人,J.Chem.Phys.150214502(2019)]。塑料晶体状态和弱氢键的影响被讨论为可以解释这些异常状态的结构特征。

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