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Preparation and characterization of nano-structured modified montmorillonite for dioxidine antibacterial drug removal in water

机译:纳米结构改性蒙脱石的制备与表征在水中二氧乙胺抗菌药物去除的制备与表征

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摘要

An inexpensive nano-structured modified adsorbent was prepared from natural montmorillonite. The optimum and significant parameters were Al3+:Co2+(11:2) with ion exchange, drying and calcination temperatures, respectively 75, 85 and 450 degrees C. The material was characterized by EDX, SEM, TEM, XRD and low-temperature nitrogen adsorption. The adsorbent was used for removing dioxidine antibiotics in water. The adsorption approximated by Langmuir, Freundlich, Tyomkin, Flory-Higgins, Dubinin-Radushkevich isotherms and kinetics pseudo-first-order, pseudo-second-order, Elovich-Chen-Clayton, Boyd, and Vebber-Morris models. The pseudo-second-order and Freundlich models most adequately describe the adsorption process. The maximum adsorption of dioxidine (96.5%) was achieved with 60 min of contact time, pH 7, dioxidine concentration 30 mg/L and adsorbent dose 5 g/L. The regeneration of the adsorbent was achieved by catalytic oxidative destruction of dioxidine with hydrogen peroxide. The reported adsorbent has shown an exceptional capability to remove dioxidine in water with the loss of about 8-10% adsorption capacity after running 5-6 times. The reported process may be assumed as an effective method for the removal of dioxidine from water with the economy due to the absence of wastewater during the regeneration of the adsorbent. (C) 2021 Elsevier B.V. All rights reserved.
机译:以天然蒙脱石为原料制备了一种廉价的纳米结构改性吸附剂。最佳工艺参数为Al3+:Co2+(11:2),离子交换温度为75℃、干燥温度为85℃、煅烧温度为450℃。通过EDX、SEM、TEM、XRD和低温氮气吸附对材料进行了表征。该吸附剂用于去除水中的二恶烷抗生素。吸附用Langmuir、Freundlich、Tyomkin、Flory Higgins、Dubinin-Radushkevich等温线和动力学拟一级、拟二级、Elovich-Chen-Clayton、Boyd和Vebber-Morris模型近似。拟二级模型和Freundlich模型最充分地描述了吸附过程。在接触时间为60min、pH值为7、二恶烷浓度为30mg/L、吸附剂剂量为5g/L的条件下,二恶烷的最大吸附量(96.5%)达到。吸附剂的再生是通过过氧化氢催化氧化破坏二恶烷来实现的。所报道的吸附剂显示出优异的去除水中二恶烷的能力,运行5-6次后,吸附能力损失约8-10%。由于吸附剂再生过程中没有废水,因此可以认为所报告的工艺是从水中去除二恶烷的一种有效方法,具有经济性。(c)2021爱思唯尔B.V.保留所有权利。

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