X射线驻波法表征多层结构超薄层性能的新方法

摘要

New method is suggested for ultra thin filmthickness and density determination, based on thedevelopment of X-ray standing wave technique at totalexternal reflection and dynamical diffraction in multilayerstructures. The possibilities of the technique are demonstratedon model samples and are used for characterisation of C/Ni/Cparameters under heat treatment.