ELECTRON BEAM INDUCED DEPOSITION OF NANOSTRUCTURES

摘要

Fabrication of nanostructures on surfaces has become a crucial topic for fabrication of modern surfacial systems. A new and one of the most versatile methods in this regard is electron beam induced deposition (EBED). In EBID, a highly focused electron beam is used to locally induce the dissociation of precursor molecules, which are further absorbed on a surface. In the ideal approach, the precursor molecule decomposes by forming the desired deposit on the surface; the volatile part of the molecule is removed with the gases flowing out of the process chamber. So far, this method was perceived as suitable for fabrication of a wide range of nanostructures or state-of-the-art mask repair tools in the semiconductor industry.