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Structure and mechanical properties of architecturally designed Ti-Al-N and Ti-Al-Ta-N-based multilayers

机译:结构和机械性能的建筑设计的Ti-Al-N和Ti-Al-Ta-N基多层

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摘要

Four Ti-Al-N/Ta-Al-N multilayer coatings were developed by a hybrid process combining arc evaporated Ti0.55Al0.45N and sputtered Ta0.57Al0.43N or Ta0.77Al0.23N layers. The two Ti0.55Al0.45N/Ta0.57Al0.43N multilayers have a bilayer period (Lambda) of 41 and 25 nm, and the two Ti0.55Al0.45N/Ta0.77Al0.23N multilayers have Lambda = 42 and 26 nm, respectively. These are compared with Ti0.51Al0.43Ta0.06N/Ta0.77Al0.23N multilayers having Lambda similar to 40, 33, 25, and 13 nm and are composed of arc evaporated Ti0.51Al0.43Ta0.06N and sputtered Ta0.77Al0.23N layers. The smallest bilayer period of similar to 13 nm was realised without mechanical shutters, simply by using the two-fold substrate rotation and target arrangement.
机译:通过组合电弧蒸发的Ti0.55A10.45N和溅射Ta0.57Al0.43N或Ta0.77Al0.23N层,通过组合电弧蒸发的杂交工艺开发了四种Ti-Al-N / Ta-Al-N多层涂层。 两Ti0.55Al0.45N / Ta0.57Al0.43N多层具有41和25nm的双层周期(Lambda),两Ti0.55Al0.45N / Ta0.77Al0.23N多层具有Lambda = 42和26nm, 分别。 将它们与Ti0.51A10.43TA0.06N / Ta0.77Al0.23N多层进行比较,其具有类似于40,33,25和13nm的λ,并且由弧蒸发的Ti0.51A10.43Ta0.06N和溅射Ta0.77Al0组成。 23n层。 只需使用双倍的基板旋转和目标布置,就实现了与13nm类似的最小双层周期而没有机械百叶窗。

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