首页> 外文期刊>Journal of the Instrument Society of India: Proceedings of the national symposium on instrumentation >An optical configuration in multi-aperture speckle interferometry for simultaneous measurement of in-plane and out-of-plane deformation
【24h】

An optical configuration in multi-aperture speckle interferometry for simultaneous measurement of in-plane and out-of-plane deformation

机译:多孔径散斑干涉术中的光学配置,可同时测量面内和面外变形

获取原文
获取原文并翻译 | 示例
           

摘要

A method for the simultaneous measurement of in-plane and out-of- plane deformation components of a deformation vector is demonstrated in this paper. In this method an object point is observed simultaneously in the directions of normal to the object surface and also at two symmetrical angles with respect to optical axis. A double exposure method is used to record the specklegram of the object under test in the image planes determined by the above mentioned directions of observation. This method allows us to study the in-plane and out-of-plane deformation simultaneously with comparable measuring sensitivity which is the order of the wavelength of the light. Experimental results on two different specimens are demonstrated.
机译:本文介绍了一种同时测量变形矢量的平面内和平面外变形分量的方法。在该方法中,在垂直于物体表面的方向上并且相对于光轴以两个对称角度同时观察到一个物体点。使用二次曝光法在由上述观察方向确定的像平面上记录被测物体的散斑图。这种方法使我们能够以可比的测量灵敏度(光波长的数量级)同时研究面内和面外变形。证明了在两个不同样本上的实验结果。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号