New prototype for the treatment of falling film liquid effluents by gliding arc discharge part II: Plasmacatalytic activity of TiO2 thin film deposited by magnetron sputterin

摘要

A new prototype of Gliding Arc Discharge (GAD) generating cold plasma at atmospheric pressure and ambient temperature was performed to treat pollutant liquid films. This study focuses on the intensification of the electrical process by the immobilization of a thin layer of TiO2 inside the GAD reactor by magnetron sputtering technology. The deposited film was analyzed by X-ray photoelectron spectroscopy (XPS) and the wettability was estimated by measuring the water contact angle (WCA).