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Tri-wavelength broadband antireflective coating built from refractive index controlled MgF2 films

机译:由折射率受控的MgF2膜制成的三波长宽带减反射涂层

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摘要

Regulation of the refractive index over a wide range is very important in the realization of tri-wavelength antireflective (AR) coating in high power laser systems, but many regulation approaches are too complex or violent to satisfy the practical requirements. Here, a simple, template-free sol-gel route was proposed to regulate the refractive index of MgF2 film by heat treating MgF2 sol and hence to control the self-assembly process of colloidal MgF2 nanocrystals. In this self-assembly process, the originally packed nanocrystals gradually evolved into bigger hollow vesicles, which reduced the refractive index of the MgF2 film from 1.38 to 1.2. When the refractive indices of the bottom and top layers were set as 1.34 and 1.2, the tri-wavelength broadband AR coating was finally realized on a quartz substrate, with the transmittance of 99.54%, 98.65% and 98.58% at 351 nm, 527 nm and 1053 nm, respectively.
机译:在高功率激光系统中实现三波长抗反射(AR)涂层时,宽范围内的折射率调节非常重要,但是许多调节方法过于复杂或剧烈,无法满足实际需求。在这里,提出了一种简单,无模板的溶胶-凝胶途径,通过热处理MgF2溶胶来调节MgF2薄膜的折射率,从而控制胶体MgF2纳米晶体的自组装过程。在这种自组装过程中,最初填充的纳米晶体逐渐演化为更大的中空囊泡,这将MgF2膜的折射率从1.38降低到1.2。当底层和顶层的折射率分别设置为1.34和1.2时,三波长宽带增透膜最终在石英基板上实现,在351 nm,527 nm处的透射率分别为99.54%,98.65%和98.58%。和1053 nm。

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