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International Conference on Metallurgical Coatings and Thin Films;ICMCTF

召开年：2005
召开地：San Diego, CA(US);San Diego, CA(US)
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1.Effects of second metal contents on microstructure and micro-hardness of ternary nitride films synthesized by cathodic arc method

机译：第二种金属含量对阴极电弧法合成三元氮化物膜组织和显微硬度的影响
- 作者：Hiroyuki Hasegawa; Tetsuya Suzuki
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
2.Production of N, H, O, and C atoms in flowing microwave discharges

机译：在流动的微波放电中产生N，H，O和C原子
- 作者：A. Ricard; C. Jaoul; F. Gaboriau; N. Gherardi; S. Villeger
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
3.Industrially-scaled large-area and high-rate tribological coating by Pulsed Laser Deposition

机译：脉冲激光沉积工业规模的大面积高速率摩擦涂层
- 作者：Jurgen M. Lackner
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
4.Characterization and formation of nanocrystalline diamonds in a-C/N films by filtered cathodic vacuum arc plasma

机译：过滤阴极真空电弧等离子体在a-C / N薄膜中表征和形成纳米晶金刚石
- 作者：W.J. Hsieh; P.S. Shih; J.H. Lin; C.C. Lin; U.S. Chen; S.C. Huang; Y.S. Chang; H.C. Shih
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
5.Indenter surface area and hardness determination by means of a FEM-supported simulation of nanoindentation

机译：通过FEM支持的纳米压痕模拟确定压头的表面积和硬度
- 作者：K.-D. Bouzakis ; N. Michailidis
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
6.Investigation of mechanical properties of TiN+MoSx coating on plasma-nitrided substrate

机译：等离子氮化衬底上TiN + MoSx涂层的力学性能研究
- 作者：Mahfujur Rahman a; Julfikar Haider a; D.P. Dowling c; P. Duggan c; M.S.J. Hashmi a; b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
7.Preparation of La0.7Sr0.3MnO3/LaNiO3 magnetic oxide superlattice structure by rf sputtering

机译：射频溅射制备La0.7Sr0.3MnO3 / LaNiO3磁性氧化物超晶格结构
- 作者：Hsin-Yi Lee a; Heng-Jui Liu a; C.-H. Hsu a; Yuan-Chang Liang b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
8.Deposition of yttria-stablized zirconia films using arc ion plating

机译：电弧离子镀沉积氧化钇稳定的氧化锆薄膜
- 作者：J.T. Chang a; C.H. Yeh a; J.L. He a; K.C. Chen a; A. Matthews b; A. Leyland b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
9.Characteristics of interface between Ta2O5 thin film and Si (100) substrate

机译：Ta2O5薄膜与Si（100）衬底之间的界面特性
- 作者：A.P. Huang; Paul K. Chu
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
10.Cu-penetration induced breakdown mechanism for a-SiCN

机译：a-SiCN的铜渗透诱导击穿机理
- 作者：C.W. Chen a; P.T. Liu b; T.C. Chang d; e; J.H. Yang d; T.M. Tsai a; H.H. Wu d; T.Y. Tseng a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
11.Tribological performance of chromium/chromium carbide multilayers deposited by r.f. magnetron sputtering

机译：r.f.沉积的铬/碳化铬多层膜的摩擦学性能磁控溅射
- 作者：M.A. Go′mez a; J. Romero a; A. Lousa a; J. Esteve a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
12.Synthesis and mechanical evaluation of quaternary Ti–Cr–Si–N coatings deposited by a hybrid method of arc ion plating and sputtering techniques

机译：电弧离子镀和溅射技术混合沉积四元Ti-Cr-Si-N涂层的合成及力学性能评估
- 作者：Dong Keun Lee;Dong Shik Kang;Ju Hyung Suh;Chan-Gyung Park;Kwang Ho Kim
- 会议名称：《》 | 2005年
13.Studies on the low dielectric SiOC(–H) thin films deposited using MTMS and oxygen as precursors by UV source assisted PECVD

机译：紫外光源辅助PECVD法以MTMS和氧气为前驱体沉积低介电SiOC（–H）薄膜的研究
- 作者：Chang Sil Yang; Meera Kannan; Chi Kyu Choi
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
14.Evaluation of Young modulus of CVD coatings by different techniques

机译：通过不同技术评估CVD涂层的杨氏模量
- 作者：C. Bellan; J. Dhers
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
15.Deposition of AlN on Al substrates by reactive magnetron sputtering

机译：反应磁控溅射在Al基体上沉积AlN
- 作者：U. Figueroa; O. Salas ; J. Oseguera
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
16.Effects of substrate bias on the reactive sputtered Zr–Al–N diffusion barrier films

机译：衬底偏压对反应性溅射Zr–Al–N扩散阻挡膜的影响
- 作者：Jian-Long Ruan a; Jow-Lay Huang a; J.S. Chen a; Ding-Fwu Lii b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
17.The effect of CeO2 abrasive size on dishing and step height reduction of silicon oxide film in STI–CMP

机译：CeO2磨料尺寸对STI-CMP中凹陷和氧化硅膜台阶高度减小的影响
- 作者：D.S. Lim a; J.W. Ahn a; H.S. Park b; J.H. Shin b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
18.On the evaluation of stresses during nanoindentation with sharp indenters

机译：关于使用尖头压头对纳米压痕过程中的应力进行评估
- 作者：N. Schwarzer a; G.M. Pharr b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
19.Effect of substrate biasing on structural and field-emissive properties of carbon nanotubes synthesized by ICP-CVD method

机译：衬底偏压对ICP-CVD法合成碳纳米管结构和场发射性能的影响
- 作者：Chang-Kyun Park; Jong-Pil Kim; Young-Do Kim; Hyun-Seok Uhm; Jin-Seok Park
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
20.Effect of test atmosphere on the tribological behaviour of the non-hydrogenated diamond-like carbon coatings against 319 aluminum alloy and tungsten carbide

机译：试验气氛对非氢化类金刚石碳涂层对319铝合金和碳化钨的摩擦学性能的影响
- 作者：E. Konca a; Y.-T. Cheng b; A.M. Weiner b; J.M. Dasch c; A.T. Alpas a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
21.Advances in multichannel ellipsometric techniques for in-situ and real-time characterization of thin films

机译：用于薄膜原位和实时表征的多通道椭圆仪技术的进展
- 作者：R.W. Collins; Ilsin An; Chi Chen; A.S. Ferlauto; J.A. Zapien
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
22.Sliding wear behaviour of electrolytic plasma nitrided cast iron and steel

机译：电解等离子渗氮铸铁和钢的滑动磨损行为
- 作者：X. Nie a; L. Wang a; Z.C. Yao b; L. Zhang b; F. Cheng b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
23.Single-target DC-pulsed deposition of lead zirconate titanate thin films: Investigation of the chemical and mechanical properties by glow-discharge optical emission spectroscopy and nanoindentation

机译：钛酸锆钛酸铅薄膜的单目标直流脉冲沉积：通过辉光放电光发射光谱和纳米压痕研究化学和机械性能
- 作者：P. Schwaller a; A. Fischer b; R. Thapliyal b; M. Aeberhard a; J. Michler a; H.J. Hug c
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
24.Nucleation and growth behavior during initial stage in sublimation epitaxy of SiC films on 6H-SiC(0001) substrate

机译：6H-SiC（0001）衬底上SiC膜升华外延初始阶段的成核和生长行为
- 作者：Soo-Hyung Seo a; Joon-Suk Song a; Myung-Hwan Oh a; Jin-Seok Park b; Yen-Zen Wang c
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
25.Synthesis and characterization of hard metal coatings by electro-plasma technology

机译：等离子体技术对硬质金属涂层的合成与表征
- 作者：P. Gupta a; G. Tenhundfeld a; E.O. Daigle a; P.J. Schilling b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
26.Cutting performance using high reliable device of Ti–Si–N-coated cutting tool for high-speed interrupted machining

机译：使用高可靠的Ti–Si–N涂层刀具的切削性能，可实现高速间断加工
- 作者：Myung Chang Kang a; .; Jeong Suk Kim a; Kwang Ho Kim b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
27.Photocatalytic performance of chromium or nitrogen doped arc ion plated-TiO2 films

机译：铬或氮掺杂电弧离子镀TiO2薄膜的光催化性能
- 作者：J.T. Chang; Y.F. Lai; J.L. He
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
28.Autocorrelation function analysis of phase formation in the initial stage of interfacial reactions of multilayered titanium–silicon thin films

机译：多层钛硅薄膜界面反应初期相形成的自相关函数分析
- 作者：T.H. Yang; S.L. Cheng; L.J. Chen
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
29.Formation of magnetite overlayer on nitrocarburized low-alloy steel by plasma postoxidation

机译：等离子体后氧化法在氮碳共渗低合金钢上形成磁铁矿覆盖层
- 作者：M. Zlatanovic′; N. Popovic′ ; Z . Bogdanov
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
30.Structural and mechanical property of Si incorporated (Ti,Cr,Al)N coatings deposited by arc ion plating process

机译：通过电弧离子镀工艺沉积的掺Si（Ti，Cr，Al）N涂层的结构和力学性能
- 作者：Kenji Yamamoto a; Susumu Kujime b; Kazuki Takahara b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
31.The crystalline structure, hardness and thermal stability of AlN/CrN superlattice coating prepared by D.C. magnetron sputtering

机译：直流磁控溅射制备的AlN / CrN超晶格涂层的晶体结构，硬度和热稳定性
- 作者：Jong-Keuk Park a; Young-Joon Baik b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
32.Properties and cutting performance of (Ti,V)N coatings prepared by cathodic arc ion plating

机译：阴极电弧离子镀制备的（Ti，V）N涂层的性能和切削性能
- 作者：N. Ichimiya a; Y. Onishi b; Y. Tanaka a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
33.Nanoindentation response of high performance fullerene-like CNx

机译：高性能富勒烯样CNx的纳米压痕响应
- 作者：J.F. Palacio a; S.J. Bull a; J. Neidhardt b; L. Hultman b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
34.Characterisation and applications of Cr–Al–N coatings

机译：Cr–Al–N涂层的表征和应用
- 作者：E. Spain a; J.C. Avelar-Batista a; M. Letch a; J. Housden a; B. Lerga b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
35.Effect of multiwalled carbon nanotube (M-CNT) loading on M-CNT distribution behavior and the related electromechanical properties of the M-CNT dispersed ionomeric nanocomposites

机译：多壁碳纳米管（M-CNT）负载量对M-CNT分散离聚物纳米复合材料的M-CNT分布行为和相关机电性能的影响
- 作者：Deuk Yong Lee; Myung-Hyun Lee; Kwang J. Kim; Seok Heo; Bae-Yeon Kim; Se-Jong Lee
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
36.Microstructure, mechanical and tribological properties of novel multi-component nanolayered nitride coatings

机译：新型多组分纳米层氮化物涂层的微观结构，力学和摩擦学性能
- 作者：Q. Yang ; L.R. Zhao
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
37.Analysing nanoindentation unloading curves using Pharr’s concept of the effective indenter shape

机译：使用Pharr有效压头形状的概念分析纳米压痕卸载曲线
- 作者：N. Schwarzer
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
38.Metal strip coating by electron beam PVD—industrial requirements and customized solutions

机译：电子束PVD进行的金属带涂层—工业要求和定制解决方案
- 作者：E. Reinhold; J. Richter; U. Seyfert; C. Steuer
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
39.Microstructural and tribological investigations of CrN coated, wet-stripped and recoated functional substrates used for cutting and forming tools

机译：用于切削和成型工具的CrN涂层，湿法剥离和再涂层功能性基材的微观结构和摩擦学研究
- 作者：R. Rebole碼; A. Martneza; R. Rodrigueza; G.G. Fuentesa; E. Spainb; N. Watsonb; J.C. Avelar-Batistab; J. Housdenb; F. Montala′c; L.J. Carrerasc; T.J. Tated
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
40.Defect evolution in thermal barrier coating systems under multi-axial thermomechanical loading

机译：多轴热机械载荷下隔热涂层系统中的缺陷演变
- 作者：Bernd Baufeld; Marion Bartsch; Serdar Dalkilic; Michael Heinzelmann
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
41.Thermal stability and bonding configuration of fluorine-modified low-k SiOC:H composite films

机译：氟改性低k SiOC：H复合膜的热稳定性和键合构型
- 作者：Shiu-Ko JangJiana; Chuan-Pu Liua; Ying-Lang Wangb; Weng-Sing Hwanga; Wei-Tsu Tsenga; 1
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
42.Preparation and characterization of nanocrystalline porous TiO2/WO3 composite thin films

机译：纳米晶多孔TiO2 / WO3复合薄膜的制备与表征
- 作者：Chao-Sheng Hsu a; Chung-Kwei Lin b; Chih-Chieh Chan a; Chung-Chieh Chang a; Chien-Yie Tsay b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
43.Plasma surface modification of TiO2 photocatalysts for improvement of catalytic efficiency

机译：TiO2光催化剂的等离子体表面改性以提高催化效率
- 作者：Chung-Kyung Jung; I.-S. Bae; Y.-H. Song; J.-H. Boo
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
44.Correlation between microstructural characteristics and the abrasion wear resistance of sealed thermal-sprayed coatings

机译：密封热喷涂涂层的微观结构特征与耐磨性之间的关系
- 作者：Sugehis Liscano; Linda Gil; Mariana H. Staia
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
45.Corrosion behaviors of Cr(N,O)/CrN double-layered coatings by cathodic arc deposition

机译：阴极电弧沉积Cr（N，O）/ CrN双层涂层的腐蚀行为
- 作者：Wei-Yu Ho; Cheng-Hsun Hsu; Dung-Hau Huang; Yen-Chun Lin; Chi-Lung Chang; Da-Yung Wang
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
46.Surface treatment selections for automotive applications

机译：汽车应用的表面处理选择
- 作者：J. Vetter; G. Barbezat; J. Crummenauer; J. Avissar
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
47.Effects of high-temperature hydrogenation treatment on sliding friction and wear behavior of carbide-derived carbon films

机译：高温加氢处理对碳化物衍生碳膜滑动摩擦和磨损行为的影响
- 作者：A. Erdemir; A. Kovalchenko; M.J. McNallan; S. Welz; A. Lee; Y. Gogotsic; B. Carroll
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
48.Cathode current distributions in an unbalanced magnetron

机译：不平衡磁控管中的阴极电流分布
- 作者：G.C.B. Clarke a; P.J. Kelly a; J.W. Bradley b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
49.Plasma nitriding of Ti6Al4V alloy and AISI M2 steel substrates using D.C. glow discharges under a triode configuration

机译：在三极管配置下使用DC辉光放电对Ti6Al4V合金和AISI M2钢基底进行等离子体氮化
- 作者：J.C. Avelar-Batista a; E. Spain a; J. Housden a; A. Matthews b; G.G. Fuentes c
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
50.Structural and chemical properties of sputter-deposited Ti–Ge–N thin films

机译：溅射沉积Ti-Ge-N薄膜的结构和化学性质
- 作者：C.S. Sandu ; R. Sanjine′s; M. Benkahoul; M. Parlinska-Wojtan; F. Le′vy
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
51.Al–Pt MOCVD coatings for the protection of Ti6242 alloy against oxidation at elevated temperature

机译：Al-Pt MOCVD涂层，用于保护Ti6242合金在高温下免受氧化
- 作者：Mathieu Delmas a; Dominique Poquillon a; Yolande Kihn b; Constantin Vahlas a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
52.Self-assembled nano-tiles of zinc-blende SiC on Si(100) using organometallic ion beam deposition with simultaneous electron beam irradiation

机译：使用有机金属离子束沉积和同时电子束辐照在Si（100）上自组装的Zn-SiC纳米碎片
- 作者：T. Matsumoto a; .; M. Kiuchi a; S. Sugimoto b; S. Goto b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
53.Aerosol-assisted chemical vapour deposition of sodium fluoride thin films

机译：气雾辅助化学气相沉积氟化钠薄膜
- 作者：Russell Binions; Claire J. Carmalt; Ivan P. Parkin
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
54.The effect of nitrogen ion implantation on the corrosion behaviour of stainless steels in chloride media

机译：氮离子注入对不锈钢在氯介质中腐蚀行为的影响
- 作者：L. Martnez Orellana ; F.J. Perez; C. Gomez
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
55.Nanoindentation and residual stress measurements of yttria-stablized zirconia composite coatings produced by electrophoretic deposition

机译：电泳沉积制备的氧化钇稳定的氧化锆复合涂层的纳米压痕和残余应力测量
- 作者：X.-J. Lu; X. Wang; P. Xiao
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
56.Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering

机译：直流和脉冲直流不平衡磁控溅射沉积的氮化钛薄膜中的残余应力
- 作者：M. Benegra a; D.G. Lamas b; M.E. Fernandez de Rapp b; N. Mingolo c; A.O. Kunrath d; R.M. Souza a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
57.Thin film stress measurement by fiber optic strain gage

机译：光纤应变计测量薄膜应力
- 作者：S.M.M. Quintero a; W.G. Quirino b; A.L.C. Triques a; L.C.G. Valente c; A.M.B. Braga a; C.A. Achete d; M. Cremona b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
58.Study on etching profile of nanoporous silica

机译：纳米多孔二氧化硅的刻蚀轮廓研究
- 作者：C.W. Chen a; T.C. Chang b; P.T. Liu d; e; T.M. Tsai a; H.H. Wu b; T.Y. Tseng a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
59.Growth kinetics of nitride layers during microwave post-discharge nitriding

机译：微波放电后氮化过程中氮化物层的生长动力学
- 作者：J.L. Bernal a; A. Fraguela b; J. Oseguera c; F. Castillo c
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
60.Applications for TiAlN- and TiO2-coatings with nanoscale surface topographies

机译：具有纳米级表面形貌的TiAlN和TiO2涂层的应用
- 作者：F. Burmeister a; C. Kohn a; R. Kuebler a; G. Kleer a; B. Bla¨si b; A. Gombert b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
61.Different carbon based thin films and their microtribological behaviour in MEMS applications

机译：不同的碳基薄膜及其在MEMS应用中的微生物学行为
- 作者：Ralf Bandorf .; Holger Lüthje; Cord Henke; Jens Wiebe; Jan-Hinrich Sick; Rolf Küster
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
62.In-situ formation of self-lubricating tribo-films for dry machinability

机译：原位形成自润滑摩擦膜以实现干切削性
- 作者：Taro Sumitomo; Tatsuhiko Aizawa; Shigeo Yamamoto
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
63.Growth and characterization of thick cBN coatings on silicon and tool substrates

机译：硅和工具基底上厚cBN涂层的生长和表征
- 作者：K. Bewiloguaa; M. Keuneckea; K. Weigela; E. Wiemannb
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
64.Improvements in the understanding and application of duplex coating systems using arc plasma technology

机译：使用电弧等离子体技术改进对双面涂层系统的理解和应用
- 作者：J.L. He; K.C. Chen; A. Davison
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
65.Effects of H2 in indium–molybdenum oxide films during high density plasma evaporation at room temperature

机译：室温下高密度等离子体蒸发过程中氢气对铟钼氧化物薄膜的影响
- 作者：Shi-Yao Suna; Jow-Lay Huang; Ding-Fwu Liib
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
66.The impact of scaling on metal thickness for advanced back end of line interconnects

机译：缩放对线路互连的高级后端金属厚度的影响
- 作者：Hsueh-Chung Chen; Su-Chen Fan; Jian-Hong Lin; Yi-Lung Cheng; Shin-Puu Jeng; Chii-Ming Wu
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
67.Nitrogen-doped titanium oxide films as visible light photocatalyst by vapor deposition

机译：氮沉积二氧化钛薄膜作为可见光催化剂的气相沉积
- 作者：Min-Chi Yang; Tien-Syh Yang; Ming-Show Wong
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
68.Infrared thermography-assisted detection of surface alteration during plasma cleaning and implications on subsequently deposited magnetron sputtered films

机译：红外热成像辅助检测等离子清洗过程中的表面变化及其对随后沉积的磁控溅射膜的影响
- 作者：M. Diesselberg a; H.-R. Stock a; R. Cremer b; H.-G. Fuss b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
69.Structures and electrochromic properties of Ta0.1W0.9Ox thin films deposited by pulsed laser ablation

机译：脉冲激光烧蚀沉积Ta0.1W0.9Ox薄膜的结构和电致变色性能
- 作者：D. Yang; L. Xue
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
70.Electrophosphorescence emission in organic light-emitting diodes based on (Sm+Eu) complexes

机译：基于（Sm + Eu）配合物的有机发光二极管的电致磷光发射
- 作者：R. Reyesa; M. Cremonaa; E.E.S. Teotoniob; H.F. Britob; O.L. Maltac
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
71.Flexible displays and stable high efficiency four terminal solar cells using thin film silicon technology

机译：采用薄膜硅技术的柔性显示器和稳定高效的四端子太阳能电池
- 作者：Arun Madan
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
72.Phase separation and formation of the self-organised layered nanostructure in C/Cr coatings in conditions of high ion irradiation

机译：高离子辐射条件下C / Cr涂层中自组织层状纳米结构的相分离和形成
- 作者：P.Eh. Hovsepian a; Y.N. Kok a; A.P. Ehiasarian a; R. Haasch b; J.-G. Wen b; I. Petrov b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
73.Time-resolved investigation of an asymmetric bipolar pulsed magnetron discharge: Influence of pressure

机译：非对称双极脉冲磁控管放电的时间分辨研究：压力的影响
- 作者：Th. Dunger ; Th. Welzel; St. Welzel ; F. Richter
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
74.Reaction-induced phase separation from supersaturated solid solution to nitride in thin films

机译：反应诱导相分离，从过饱和固溶体到薄膜中的氮化物
- 作者：S. Muraishi; T. Aizawa; H. Kuwahara
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
75.Influence of oxide phase formation on the tribological behaviour of Ti–Al–V–N coatings

机译：氧化物相形成对Ti–Al–V–N涂层的摩擦学行为的影响
- 作者：K. Kutschej a; P.H. Mayrhofer b; M. Kathrein c; P. Polcik d; C. Mitterer b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
76.Deposition of MgO thin film by liquid pulsed injection MOCVD

机译：液体脉冲注入MOCVD法沉积MgO薄膜
- 作者：M. Manin a; S. Thollon a; F. Emieux a; G. Berthome b; M. Pons b; H. Guillon c
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
77.Observation of fracture and plastic deformation during indentation and scratching inside the scanning electron microscope

机译：扫描电子显微镜内压痕和刮擦过程中的断裂和塑性变形的观察
- 作者：R. Rabe a; J.-M. Breguet b; P. Schwaller a; S. Stauss a; F.-J. Haug a; J. Patscheider a; J. Michler a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
78.Coating elastic–plastic properties determined by means of nanoindentations and FEM-supported evaluation algorithms

机译：通过纳米压痕和FEM支持的评估算法确定涂层的弹塑性
- 作者：K.-D. Bouzakis; N. Michailidis
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
79.The use of Raman spectroscopy to identify strain and strain relaxation in strained Si/SiGe structures

机译：拉曼光谱法在应变Si / SiGe结构中识别应变和应变弛豫
- 作者：P. Dobrosz a; S.J. Bull a; S.H. Olsen b; A.G. O’Neill b
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
80.Adhesion strength of multi-layered diamond films on WC–Co alloy substrate

机译：多层金刚石膜在WC-Co合金基底上的附着强度
- 作者：Sadao Takeuchi a; Masaharu Kojima a; Sigeto Takano b; Kazutaka Kanda b; Masao Murakawa a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
81.Optimisation of the new time-modulated CVD process using the Taguchi method

机译：使用Taguchi方法优化新的时间调制CVD工艺
- 作者：N. Ali a;V.F. Neto a;Sen Mei b;G. Cabral a;Y. Kousar a;E. Titus a;A.A. Ogwu c;D.S. Misra d;J. Gracio a
- 会议名称：《》 | 2005年
82.Electrical and optical properties of TCO–Cu2O heterojunction devices

机译：TCO–Cu2O异质结器件的电学和光学特性
- 作者：Hideki Tanakaa; Takahiro Shimakawaa; Toshihiro Miyataa; Hirotoshi Satob; Tadatsugu Minamia
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
83.Raman analysis of Si–C–N films grown by reactive magnetron sputtering

机译：反应磁控溅射生长的Si–C–N薄膜的拉曼分析
- 作者：E.J. Liang a; J.W. Zhang c; J. Leme a; C. Moura a; L. Cunha a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年
84.Ferroelectric thin films on silicon carbide for next-generation nonvolatile memory and sensor devices

机译：碳化硅上的铁电薄膜用于下一代非易失性存储器和传感器设备
- 作者：Mikael O¨ stling a; Sang-Mo Koo b; Carl-Mikael Zetterling a; Sergey Khartsev a; Alex Grishin a
- 会议名称：《International Conference on Metallurgical Coatings and Thin Films;ICMCTF》 | 2005年