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Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries

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1.Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool

机译：在簇工具中使用光谱椭圆形测量综合计量的可行性和适用性
- 作者：Pierre Boher;Jean Philippe Piel;Jean Louis Stehle;Christopher Pickering;Alexandre Tarnowka
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- spectroscopic ellipsometry;
- SiGe;
- cluser tool;
- integrated metrology;
2.Recent Developments in Spectroscopic Ellipsometry for in situ Applications

机译：最近在原位应用中的光谱椭圆测量的发展
- 作者：Blaine Johs;Jeff Hale;N. J. Ianno;Craig M. Herzinger;Tom Tiwald;John A. Woollam
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- ellipsometry;
- spectroscopy;
- in situ;
- real-time;
- process control;
3.Recommendations for the metrological calibration of SPMs: a survey on the European SPMet network project

机译：SPMS计量校准的建议：欧洲SPMet网络项目调查
- 作者：Hendrik Rothe;Gunter Wilkening;Dorothee Huser
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- scanning probe microscopy;
- calibration procedures;
- round robin tests;
- calibration artifacts;
4.AFM tip calibration using nanometer-sized structures induced by ion beam sputtering

机译：AFM尖端校准使用离子束溅射引起的纳米尺寸结构
- 作者：Frank Frost;Dietmar Hirsch;Axel Schindler;Bernd Rauschenbach
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- sputtering;
- topography;
- morphology;
- atomic force microscopy;
- AFM tip;
- thin film;
5.Measurement of the elastic constants of nanometric films

机译：测量纳米膜的弹性常数
- 作者：Marco G. Beghi;Carlo E. Bottani;Andrea Li Bassi;B. K. Tanner;A. C. Ferrari;K. B. K Teo;J. Robertson
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
6.Measuring small absorption losses of laser pulses in fused silica by a pump and probe technique

机译：通过泵和探头技术测量熔熔二氧化硅中激光脉冲的小吸收损失
- 作者：Ch. Muhlig;S. Kufert;S. Bark-Zollmann;W. Triebel
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- fused silica;
- laser induced absorption;
- pump and probe technique;
- probe beam deflection;
7.Automated high-accuracy measuring system for specular micro-reflectivity

机译：用于镜面微反射率的自动化高精度测量系统
- 作者：Ruediger Grunwald;Stefan Nerreter;Jens Wolfgang Tomm;Sandy Schwirzke-Schaaf;Fabian Dorfel
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- reflectivity;
- spatial resolution;
- thin film micro-optics;
- AR coatings;
- GRIN lenses;
- diode laser facet;
8.Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157nm

机译：组合计量包括VUV光谱椭圆仪和放牧X射线反射率，用于在157nm处精确表征薄膜和多层
- 作者：Pierre Boher;Patrick Evrard;Jean Philippe Piel;Jean Louis Stehle
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- spectroscopic ellipsometry;
- grazing x-ray reflectance;
- 157nm;
- VUV;
- UV lithography;
9.Infrared Spectroscopic Ellipsometry for nondestructive characterization of free-carrier and crystal-structure properties of group-III-nitride semiconductor device heterostructures

机译：红外光谱椭圆形测定法，用于无损载体和晶体结构性能的非破坏性表征 - III-氮化物半导体器件异质结构
- 作者：Mathias Schubert;Alexander Kasic;Stephan Figge;Marc Diesselberg;Seven Einfeldt;Detlef Hommel;Ulrich Kohler;Donat Josef As;Jurgen Off;Bertram Kuhn
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- infrared;
- ellipsometry;
- anisotropy;
- dielectric function;
- phonon modes;
- free-carrier absorption;
- GaN;
- AlGaN;
- AlInN;
- InGaN;
- laser diode;
- light emitting diode;
10.Present and future industrial metrology needs for Qualification of High Quality Optical Micro Lithography Materials

机译：目前和未来的高质量光学微型光刻材料资格的工业计量需求
- 作者：A. Engel;E. Morsen;A. Jordanov;K. Knapp
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
11.Accurate sizing of deposited PSL spheres from light scatter measurements

机译：从光散射测量的沉积PSL球体的精确尺寸
- 作者：John C. Stover;Craig A. Scheer
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- PSL spheres;
- particle sizing;
- particle depositions;
- light scatter;
- scanner calibration;
12.A Versatile Optical System for Static and Dynamic Thermo-Magnetic Recording Using A Scanning Laser Microscope

机译：一种多功能光学系统，用于使用扫描激光显微镜静态和动态热磁录制
- 作者：Warwick Clegg;David Jenkins;Na Helian;James Windmill;Robert Windmill
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- scanning laser microscopy;
- magneto-optics;
- thermo-magnetic recording;
13.Quasi Confocal Extended Field Surface Sensing

机译：准共聚焦延长场表面传感
- 作者：Joseph Cohen-Sabban;Jerome Gaillard-Groleas;Pierre-Jean Crepin
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
14.The use of light scatter signals to identify particle material

机译：使用光散射信号来识别颗粒材料
- 作者：J. C. Stover;V. Ivakhnenko;Y. A. Eremin
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- light scatter;
- particle scanner;
- PSL;
- silicon wafer;
- particle contamination;
- true particle sizing;
15.Measuring the scatter distribution of PSL spheres on Si wafers using a fast calibrated CMOS photo detector array

机译：使用快速校准的CMOS照片探测器阵列测量Si晶片上PSL球体的分布分布
- 作者：Thomas Rinder;Hendrik Rothe
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
16.Standardisation of the Measurement of Laser Induced Damage Threshold and Material Absorption

机译：激光诱导损伤阈值和材料吸收测量的标准化
- 作者：Roger M. Wood
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- standardisation;
- laser induced damage;
- threshold;
- absorption;
17.Interferometric metrology of wafer nanotopography for advanced CMOS process integration

机译：高级CMOS工艺集成晶圆纳米术的干涉计量
- 作者：John F. Valley;Chris L. Koliopoulos;Shouhong Tang
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
18.IR spectroscopic ellipsometry for industrial characterization of semiconductors

机译：用于半导体的工业表征的IR光谱椭圆形
- 作者：Pierre Boher;Marc Bucchia;Jean Philippe Piel;Christophe Defranoux;Jean Louis Stehle;Christopher Pickering
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- spectroscopic ellipsometry;
- infrared;
- low k dielectrics;
- epitaxial structures;
- dopants;
19.Advantages of a new sub-nanometer aspheric profiling technique with respect to the unique requirements of EUV lithography mirrors

机译：新型亚纳米非球面分析技术的优点对于EUV光刻镜的独特要求
- 作者：Paul Glenn
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- metrology;
- full aperture;
- noncontact;
- aspheric;
- profilometer;
- self-referencing;
- EUV;
- lithography;
20.Measurement of absorptance of optical coatings for F_2 lithography

机译：用于F_2光刻光学涂层吸收率的测量
- 作者：Chidane Ouchi;Masanobu Hasegawa;Akira Matsumoto;Kazuho Sone
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- absorptance;
- calorimetry;
- F_2 laser;
- optical coating;
21.Effects of particle shape on particle identification and scatter predictions

机译：粒子形状对粒子识别和散射预测的影响
- 作者：V. Ivakhnenko;J. C. Stover;Craig A. Scheer;Y. A. Eremin
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- light scatter;
- particle scanner;
- PSL;
- silicon wafer;
- particle shape;
- true particle sizing;
22.Measurement of total integrated scatter of optical coatings for 157nm lithography

机译：用于157nm光刻的光学涂层总集成散射的测量
- 作者：T. Saito;J. Saito;E. Nakamura;T. Kudo;M. Kagaya;T. Takahashi
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- Coblentz hemisphere;
- 157nm optics;
- coating;
- scatter;
23.The Rapid Confocal Sensor, a non contact profilometer for fast 3D sub micron inspection and metrology of large formats

机译：快速的共聚焦传感器，一种用于快速3D亚微米检测和大型计量的非接触式轮廓仪
- 作者：David Vaughnn;Cory Watkins;Dick Anderson
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- non contact;
- profilometry;
- topography;
- confocal;
- sub micron inspection;
- metrology;
24.How to measure sub-ppm optical homogeneity in fused silica: impact of temperature on accuracy and reproducibility

机译：如何测量熔融二氧化硅中的子PPM光学均匀性：温度影响对精度和再现性
- 作者：Doerte Schoenfeld;Bodo Kuehn;Armin Steinert;Ralf Takke
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- fused silica;
- homogeneity;
- interferometry;
- temperature;
- reproducibility;
25.X-ray study of surfaces and interfaces

机译：表面和界面的X射线研究
- 作者：Victor E. Asadchikov;Inna N. Bukreeva;Angela Duparre;Igor V. Kozhevnikov;Yury S. Krivonosov;Christian Morawe;Mikhail V. Pyatakhin;Jorg Steinert;Alexander V. Vinogradov;Eric Ziegler
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- roughness;
- x-ray scattering;
- x-ray reflectometry;
- atomic force microscopy;
26.Diffractive Solid Immersion Lenses Characterization and Manufacturing

机译：衍射固体浸没镜片表征和制造
- 作者：R. Brunner;J. Bischoff;K. Rudolf;M. Ferstl
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
27.Rapid X-Ray Reflectivity (XRR) characterization and Process Monitoring of Multilayer Ta/Al_2O_3/Ta/SiO_2/Si

机译：多层TA / AL_2O_3 / TA / SI / SI的快速X射线反射率（XRR）表征和过程监控
- 作者：Jingmin Leng;Jon Opsal
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- X-ray reflectivity (XRR);
- high-k dielectric;
- Al_2O_3;
- Tantalum;
- density;
- and roughness;
28.Stitching interferometry of aspherical surfaces

机译：缝合非球面表面的干涉测量法
- 作者：T. Hansel;A. Nickel;A. Schindler
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- stitching interferometry;
- sub-aperture interferometry;
- aspherical surfaces;
29.Measurement of steep aspheres: a step forward to nanometer accuracy

机译：陡峭的球体测量：向前纳米精度的一步
- 作者：Ingolf Weingartner;Michael Schulz;Peter Thomsen-Schmidt;Clemens Elster
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- aspheres;
- complex surfaces;
- ultra-precision;
- topography;
- curvature;
30.Polarized light scattering from metallic particles on silicon wafers

机译：硅晶片上金属颗粒的偏振光散射
- 作者：Jung Hyeun Kim;Sheryl H. Ehrman;George W. Mulholland;Thomas A. Germer
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- copper;
- gold;
- inspection;
- metal;
- particles;
- polarization;
- scattering;
- spheres;
31.Microstructure of thin films: correlation with laser damage threshold

机译：薄膜的微观结构：与激光损伤阈值相关
- 作者：Jerzy Ciosek;Wojciech Paszkowicz;Piotr Pankowski;Jerzy B. Pelka;Lech T. Baczewski;Jan Marczak;Roman Ostrowski
- 会议名称：《Conference on Optical metrology roadmap for the semiconductor, optical, and data storage industries》 | 2001年
- optical coatings;
- thin films;
- atomic force microscopy;
- x-ray diffraction;
- laser damage;